Maskless lithography encompasses a suite of methods that eliminate the need for physical photomasks by using programmable optical elements or direct‐write beams to define patterns on photoresist ...

Purdue University alumnus Sergey Zakharov, co-founder and chief technology officer of ZS Instruments, holds an optical encoder wafer created by a prototype of the company’s novel technology. ZS ...

We employ a straightforward stacking approach to integrate ultrathin materials with metasurfaces, overcoming the technical ...

Overlay metrology tools improve accuracy while delivering acceptable throughput, addressing competing requirements in increasingly complex devices. In a race that never ends, on-product overlay ...

The Elionix ELS-G100 electron beam lithography system produces a highly stable beam with a diameter as small 1.8nm, using acceleration voltages of up to 100kV and high beam currents. This allows fine ...

Nikon ( (JP:7731)) just unveiled an update. Nikon said it will book one-time costs of ¥11.3 billion in its Precision Equipment Business for the March 2026 quarter, reflecting impairment losses on ...

Leading figures in China's semiconductor industry are urging the central government to launch a coordinated national ...